Sputtering Power Supplies

Low and High Voltage Power Supplies

Sputtering Power Supplies

The IPOS series power supplies are intended for hard use in industrial vacuum plasma processes.
We offer 4 series of magnetron sputtering power supply according to each wave type with power levels up to 20kW.

The Ipos series use a superior arc suppression technology for better quality and productivity in hard-coat, glass/optical coat applications

Features

- Very fast arc detection and suppression (< 2us)
- Arc energy may be adjusted
- Digital control based on 32bit DSP guarantees high accuracy and repeatability
- Excellent dynamic regulation characteristic for voltage, current, and power
- Remote control interface serial communication using RS 232 or RS485
- Fully protected against output short and open circuits.
- Under Voltage, Over Voltage, Over Load, Thermal, Fuse, Power Fault diagnostics

High power pulsed magnetron sputtering can generate a dense plasma with high target material ion content, using essentially conventional magnetron sputtering equipment.
Ipos-HP power supply capable of peak powers up to 2MW, peak currents to 1200A, at discharge voltages reaching 2kV has been designed and built.
Ipos-HP technology enables the practical application of a whole range of sputtering processes, based an pulsing magnetrons operating at high peak powers.

Ti target 3 mTorr, repetition frequency of 500 Hz

For Further information on the IPOS range, please contact :

apps@mgpower.co.uk